金属加热器

Products

大纲

金属加热器由于加热迅速且均匀，可实现精确的温度控制，适用于中低温的各种薄膜处理等。

工作温度

Al < 450℃

特征

thermal conductivity

high

temperature uniformity

good

Temperature Control Precision

EXCELLENT

应用领域

Chemical Vapor Deposition(CVD)
Atomic Layer Deposition (ALD)
Ashing

类型和尺寸

Block heaters

尺寸

150mm

200mm

Pedestal Heaters

尺寸

150mm

200mm

300mm

Coating Technology

通过多种表面处理实现耐腐蚀性、耐久性等

AlFx

Rapid Thermal Processing (RTP)
Lamphousing

大纲

RTP是一种在几秒钟内将硅晶片加热到1,000°C以上的工艺。Halogen（或Tungsten Halogen）灯产生的红外线通过聚光镜瞬间传递到晶圆上。加热后缓慢冷却晶圆以防止Thermal Shock。

工作温度

rtp < 1,000℃

特征

集中加热
低热处理量
易于控制周围环境
缩短工艺时间

应用领域

Annealing
Dopant Activation

类型和尺寸

· AMAT Vantage Plus
· AMAT Centura

材料

stainless steel & copper brazed

灯 #

409

尺寸

300mm

Products

metal
heaters

overview

METAL HEATERS are excellent for applications that require precise temperature control as the material properties of Al allow quick and uniform heating.

operating temperature

Al < 450℃

characteristics

thermal conductivity

high

temperature uniformity

good

Temperature Control Precision

EXCELLENT

application

Chemical Vapor Deposition(CVD)
Atomic Layer Deposition (ALD)
Ashing

types & sizes

Block Heaters

sizes

150mm

200mm

Pedestal Heaters

sizes

150mm

200mm

300mm

Coating Technology

Enhancement of Corrosion Resistance and Durability through Surface Treatments

AlFx

Rapid Thermal Processing (RTP)
Lamphousing

overview

RTP is a process that heats silicon wafers to over 1,000°C in just a few seconds. Infrared rays generated by halogen(or tungsten-halogen) lamps are instantly transmitted to the wafer through a condenser lens. After heat treatment, the wafer is slowly cooled to prevent thermal shock.

operating temperature

rtp < 1,000℃

characteristics

Concentrated Heating
Efficient Heat Treatment
Better Environmental Control
Reduced Lead Time

application

Annealing
Dopant Activation

types & sizes

· AMAT Vantage Plus
· AMAT Centura

materials

stainless steel & copper brazed

lamp #

409

sizes

300mm

Products

metal
heaters

overview

METAL HEATER는 빠르고 균일한 가열로 인해 정밀한 온도 조절이 가능하여 중-저온의 다양한 막질 처리 등에 사용됩니다.

operating temperature

Al < 450℃

characteristics

thermal conductivity

high

temperature uniformity

good

Temperature Control Precision

EXCELLENT

application

Chemical Vapor Deposition(CVD)
Atomic Layer Deposition (ALD)
Ashing

types & sizes

Block Heaters

sizes

150mm

200mm

Pedestal Heaters

sizes

150mm

200mm

300mm

Coating Technology

다양한 표면처리를 통해 내식성, 내구성 등을 구현

AlFx

Rapid Thermal Processing (RTP)
Lamphousing

overview

RTP LAMP HOUSING은 실리콘 웨이퍼를 단 몇 초의 짧은 시간 내 1,000°C 이상으로 가열하는 공정에 사용됩니다. 할로겐(또는 텅스텐-할로겐) 램프로 생성된 적외선을 집광렌즈 통해 웨이퍼에 순간적으로 전달합니다. 가열 후에는 웨이퍼를 서냉시켜 Thermal Shock를 방지합니다.

operating temperature

rtp < 1,000℃

characteristics

집중가열
낮은 열처리량
주변환경 제어 용이
공정 시간 단축

Products